| 引用本文： |
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肖功利,杨宏艳.喷涂热分解法制备SnO2·F薄膜及其光电性能研究[J].广西科学院学报,2005,(S1):1-4. [点击复制]
- Xiao Gongli,Yang Hongyan.Study on Preparation and Photoelectric Property of Fluorine-doped Tin Oxide Thin Films by Spray Pyrolysis Process[J].Journal of Guangxi Academy of Sciences,2005,(S1):1-4. [点击复制]
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| 摘要: |
| 以SnCl4·5H2O和NH4F为原料,用喷涂热分解法在石英玻璃上制备SnO2·F薄膜。采用X光电子能谱分析仪(XPS)和X光衍射仪(XRD)分别表征SnO2·F薄膜的成分和晶体结构,研究了F-的掺杂量和热处理对薄膜方块电阻、可见光区透射率和红外光区反射率的影响。实验结果表明,用本次实验的配方,衬底温度TS大致450℃,喷涂时间为15s时,薄膜的方块电阻R□为0.2~4kΩ/□,可见光透过率达T≈80%和红外光反射率R≈80%以上。样品在O2及N2气氛中进行一定温度范围的退火处理后,其电阻率上升。 |
| 关键词: 薄膜 掺氟二氧化锡 制备 光电性能 喷涂热分解 |
| DOI： |
| 投稿时间：2005-09-05 |
| 基金项目: |
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| Study on Preparation and Photoelectric Property of Fluorine-doped Tin Oxide Thin Films by Spray Pyrolysis Process |
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Xiao Gongli1, Yang Hongyan2
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| (1.Dept. of Communications and Info. Tech., Guilin Univ. of Electricns Tech., Guilin, Guangxi, 541004, China;2.Dept. of Comp., Guilin Coll. of Electricns Tech., Guilin, Guangxi, 541004, China) |
| Abstract: |
| By using SnCl4·5H2O and NH4F as raw materials,the Fluorine-doped SnO2 thin films were prepared on quartz glass flat substrates by spray pyrolysis process.The crystal structure and component of the thin films were characterized by using XRD and XPS.The effects of F- contents and annealing treatment on the sheet ressitance and photic transmission ratio in visible light range and photic reflectivity in infrared ray range.of the thin films were investigated.The results show that the R□ of SnO2·F thin films can reach to 0.2~4kΩ/□,Its photic transmission ratio in visible light range and its photic reflectivity in infrared ray range both around reachs 80%.The sheet resistance ratio of SnO2·F thin films rised,after the sample of the thin film is annealed in the O2 and N2 atmosphere according to certain temperature extension. |
| Key words: film fluorine-doped tin dioxide preparation electric property spray pyrolysis |
